Incamake imwe
Mubikorwa byahurijwe hamwe byo gukora, Photolithography ninzira yibanze igena urwego rwo guhuza imiyoboro ihuriweho. Igikorwa cyiki gikorwa nukwohereza mu budahemuka no guhererekanya amakuru yerekana ibishushanyo mbonera biva muri mask (nanone bita mask) kuri semiconductor material substrate.
Ihame ryibanze ryibikorwa bya fotolithographie nugukoresha reaction ya Photochemic reaction yumufotozi washyizwe hejuru yubutaka kugirango yandike imiterere yumuzunguruko kuri mask, bityo agere ku ntego yo kwimura imiterere yumuzunguruko ihujwe kuva mubishushanyo kugeza kuri substrate.
Inzira yibanze ya Photolithography:
Ubwa mbere, umufotozi akoreshwa hejuru yubutaka akoresheje imashini itwikiriye;
Hanyuma, imashini ifotora ikoreshwa mugushira ahabona substrate yashizwemo nabafotora, hanyuma uburyo bwo gufata amafoto bukoreshwa mukwandika amakuru yerekana ishusho yoherejwe na mashini ya Photolithography, ikarangiza kwizerwa, kwimura no kwigana icyitegererezo cya mask kuri substrate;
Ubwanyuma, uwashizeho iterambere akoreshwa mugutezimbere substrate yerekanwe kugirango akureho (cyangwa agumane) umufotozi ukora reaction ya fotokome nyuma yo kwerekanwa.
Uburyo bwa kabiri bwo gufotora
Kugirango wimure igishushanyo mbonera cyateganijwe kuri mask kuri wafer ya silicon, ihererekanyabubasha rigomba kubanza kugerwaho binyuze muburyo bwo kwerekana, hanyuma icyitegererezo cya silicon kigomba kuboneka binyuze muburyo bwo gutobora.
Kubera ko kumurika ahakorerwa fotolithographe ikoresha isoko yumucyo wumuhondo aho ibikoresho bifotora bitumva, byitwa kandi urumuri rwumuhondo.
Photolithography yakoreshejwe bwa mbere mu nganda zicapura kandi yari tekinoroji nyamukuru yo gukora PCB kare. Kuva mu myaka ya za 1950, Photolithography yahindutse buhoro buhoro ikoranabuhanga nyamukuru ryo guhererekanya imiterere mubikorwa bya IC.
Ibipimo byingenzi byerekana uburyo bwa lithographie harimo gukemura, kwiyumvisha ibintu, kurenza urugero, igipimo cy inenge, nibindi.
Ibikoresho byingenzi mubikorwa bya fotolithographie ni fotoreziste, nikintu gifotora. Kubera ko ibyiyumvo byamafoto biterwa nuburebure bwumurongo wumucyo, ibikoresho bitandukanye bifotora birakenewe muburyo bwo gufotora nkumurongo wa g / i, 248nm KrF, na 193nm ArF.
Inzira nyamukuru yuburyo busanzwe bwa Photolithography ikubiyemo intambwe eshanu:
-Gutegura filime;
-Gusaba gufotora no guteka byoroshye;
-Guhuza, kwerekana no guteka nyuma yo guteka;
-Gutegura firime ikomeye;
-Gushakisha iterambere.
(1)Gutegura firime: cyane cyane gusukura no kubura umwuma. Kuberako ibyanduye byose bizaca intege guhuza hagati yifotozi na wafer, isuku yuzuye irashobora kunoza guhuza hagati ya wafer nuwifotora.
(2)Gufata amafoto: Ibi bigerwaho no kuzunguza wafer ya silicon. Abafotora batandukanye bakeneye ibipimo bitandukanye byo gutwikira, harimo umuvuduko wo kuzunguruka, uburebure bwa fotore, nubushyuhe.
Guteka byoroheje: Guteka birashobora kunoza guhuza hagati yifotozi na wafer ya silicon, hamwe nuburinganire bwumubyimba wa fotore, bifasha mugucunga neza ibipimo bya geometrike yuburyo bukurikira.
(3)Guhuza no kwerekana: Guhuza no kwerekana ni intambwe zingenzi muburyo bwo gufotora. Bavuga guhuza igishushanyo cya mask hamwe nuburyo buriho kuri wafer (cyangwa igishushanyo mbonera cy'imbere), hanyuma bakayimurikira hamwe n'umucyo wihariye. Ingufu zumucyo zikora ibice bifotora mumafoto, bityo ikohereza mask ya fotore.
Ibikoresho bikoreshwa muguhuza no kwerekana ni imashini ya Photolithography, nigikoresho kimwe gihenze cyane cyibikoresho bitunganyirizwa mubikorwa byose byuzuzanya. Urwego rwa tekiniki yimashini ifotora yerekana urwego rwo gutera imbere kumurongo wose.
Guteka nyuma yo gutekwa: bivuga uburyo bwo guteka mugihe gito nyuma yo kwerekanwa, bigira ingaruka zitandukanye ugereranije nabafotora ultraviolet ndende hamwe naba fotora basanzwe i-murongo.
Kumafoto ya ultraviolet yimbitse, guteka nyuma yo kwerekana ibyokurya bikingira ibintu bifotora, bikemerera gufotora gushonga mubateza imbere, bityo guteka nyuma yo kwerekana ni ngombwa;
Kubafotozi basanzwe i-umurongo, guteka nyuma yo kwerekanwa birashobora kunoza imiterere yumufotozi no kugabanya imiraba ihagaze (imiraba ihagaze bizagira ingaruka mbi kumiterere ya morphologie yumufotozi).
(4)Gutezimbere firime ikomeye.
Ibipimo byingenzi byiterambere byiterambere birimo ubushyuhe bwiterambere nigihe, iterambere ryabatezimbere hamwe nibitekerezo, gukora isuku, nibindi. Guhindura ibipimo bifatika mugutezimbere, itandukaniro ryikigereranyo cyo gusesa hagati yibice byerekanwe kandi bitagaragara bya fotoreiste birashobora kwiyongera, bityo kubona ingaruka ziterambere.
Gukomera bizwi kandi no guteka guteka, aribwo buryo bwo kuvanaho ibisigara bisigaye, biteza imbere, amazi nibindi bikoresho bitari ngombwa bisigaye mumafoto yateye imbere mubishyushya no kubishiramo umwuka, kugirango tunonosore ifatizo ryabafotora kuri substrate ya silicon kandi kurwanira kwifata kwabafotora.
Ubushyuhe bwibikorwa byo gukomera buratandukanye bitewe nabafotora batandukanye nuburyo bukomeye. Ikigaragara ni uko imiterere yifotozi idahinduka kandi uwifotora agomba gukorwa cyane bihagije.
(5)Igenzura ryiterambere: Ibi ni ukugenzura inenge muburyo bwo gufotora nyuma yiterambere. Mubisanzwe, tekinoroji yo kumenyekanisha amashusho ikoreshwa muguhita isikana chip nyuma yo kwiteza imbere no kuyigereranya nububiko bwabitswe mbere yubusa. Niba hari itandukaniro ryabonetse, rifatwa nkinenge.
Niba umubare w'inenge urenze agaciro runaka, wafer ya silicon isuzumwa ko yatsinzwe ikizamini cyiterambere kandi irashobora gukurwaho cyangwa gukorwa nkuko bikwiye.
Mubikorwa byahurijwe hamwe byumuzunguruko, inzira nyinshi ntizisubirwaho, kandi Photolithography nimwe mubikorwa bike cyane bishobora gukorwa.
Amafoto atatu n'ibikoresho byo gufotora
3.1 Photomask
Photomask, izwi kandi nka mask ya Photolithography, ni umuhanga ukoreshwa mugikorwa cya Photolithography mugikorwa cyo guhuza imirongo ya wafer.
Igikorwa cyo gukora Photomask nuguhindura amakuru yumwimerere asabwa mubikorwa bya wafer byakozwe nabashakashatsi bashushanya ibizunguruka byuzuzanya muburyo bwamakuru ashobora kumenyekana na generator yerekana amashanyarazi cyangwa ibikoresho bya elegitoronike yerekana ibikoresho binyuze mumasoko ya mask, kugirango bibe byerekanwa na ibikoresho byavuzwe haruguru kubikoresho bya fotomask bifatanye nibikoresho bifotora; noneho biratunganywa binyuze murukurikirane rwibikorwa nko kwiteza imbere no kuroba kugirango bikosore igishushanyo cyibikoresho bya substrate; amaherezo, irasuzumwa, igasanwa, igasukurwa, kandi ikanashyirwa muri firime kugirango ikore ibicuruzwa bya mask kandi bigezwa ku ruganda rukora imashanyarazi kugirango rukoreshwe.
3.2
Abafotora, bazwi kandi nkabafotora, nibikoresho bifotora. Ibice bifotora byiyumvamo bizahindura imiti munsi yumucyo wumucyo, bityo bitume impinduka zigabanuka. Igikorwa cyacyo nyamukuru nukwimura igishushanyo kuri mask kuri substrate nka wafer.
Ihame ryakazi ryabafotora: Icya mbere, uwifotora yometse kuri substrate hanyuma abanza gutekwa kugirango akureho umusemburo;
Icya kabiri, mask ihura numucyo, bigatuma ibice byifotozi byunvikana mugice cyerekanwe bigira imiti;
Noneho, nyuma yo kwerekana ibyokurya birakorwa;
Hanyuma, uwifotora asesekara igice binyuze mumajyambere (kubifotozi byiza, agace kagaragaye karaseswa; kubifotora nabi, agace katagaragaye karashonga), bityo bikamenya kwimura uburyo bwimikorere yumuzunguruko uva muri mask ukajya muri substrate.
Ibigize abafotora cyane cyane birimo firime ikora resin, ibice bifotora, ibyongeweho na solvent.
Muri byo, resin ikora firime ikoreshwa mugutanga imiterere yubukanishi no kurwanya ibibyimba; ibice bifotora bigira ihinduka ryimiti munsi yumucyo, bigatera impinduka mugipimo cyo gusesa;
Inyongeramusaruro zirimo amarangi, ibyongerera imbaraga, nibindi, bikoreshwa mugutezimbere imikorere yifotozi; ibishishwa bikoreshwa mugushonga ibice no kubivanga neza.
Abafotora muri iki gihe bakoreshwa cyane barashobora kugabanywamo abafotozi gakondo hamwe naba fotora bongerewe imiti bakurikije uburyo bwa reaction ya Photochemical reaction, kandi birashobora no kugabanywa muri ultraviolet, ultraviolet yimbitse, ultraviolet ikabije, urumuri rwa elegitoronike, urumuri rwa ion na X-ray nkuko bivugwa na amafoto yumubyimba.
Ibikoresho bine bifotora
Tekinoroji ya Photolithographe yanyuze mubikorwa byiterambere byitumanaho / hafi ya lithographie, optique projection lithographie, intambwe-kandi-isubiramo lithographie, scanne lithographie, lithographie immersion, na EUV lithographie.
4.1 Twandikire / Imashini ya Lithographie
Ikoreshwa rya tekinoroji ya lithographie yagaragaye mu myaka ya za 1960 kandi yakoreshejwe cyane muri za 1970. Nibwo buryo bukuru bwa lithographie mugihe cyibihe bito bito byinjizwamo kandi byakoreshwaga cyane cyane kubyara imiyoboro ihuriweho hamwe nubunini burenze 5μm.
Muri mashini yo guhuza / hafi yimashini ya lithographie, wafer isanzwe ishyirwa kumurongo wintoki igenzurwa nintambwe itambitse kandi ikazunguruka. Umukoresha akoresha microscope yihariye kugirango yitegereze icyarimwe umwanya wa mask na wafer, kandi akanayobora intoki umwanya wakazi kugirango uhuze mask na wafer. Nyuma ya wafer na mask bimaze guhuzwa, byombi bizakanda hamwe kugirango mask ihure neza na fotoreiste hejuru ya wafer.
Nyuma yo gukuraho intego ya microscope, gukanda wafer na mask byimuriwe kumeza yerekanwe kugirango bigaragare. Itara ritangwa n'itara rya mercure ryegeranijwe kandi rihwanye na mask binyuze mumurongo. Kubera ko mask ihuye neza na fotoreististe kuri wafer, ishusho ya mask yimurirwa kumurongo wa fotoreiste ku kigereranyo cya 1: 1 nyuma yo kugaragara.
Menyesha ibikoresho bya lithographie nibikoresho byoroheje kandi byubukungu byububiko bwa optique, kandi birashobora kugera kumashusho yubunini bwa sub-micron, bityo biracyakoreshwa mubikorwa bito bito byubushakashatsi nubushakashatsi bwa laboratoire. Mu bicuruzwa binini byuzuzanya by’umuzunguruko, tekinoroji ya lithographie yegeranye yatangijwe kugirango hirindwe kwiyongera kw'ibiciro bya lithographie biterwa no guhura hagati ya mask na wafer.
Imyandikire yegeranye yakoreshejwe cyane mu myaka ya za 70 mugihe cyibihe bito bito byuzuzanya hamwe nigihe cyambere cyumuzingi uciriritse. Bitandukanye na lithographie yo guhuza, mask iri hafi ya lithographie ntabwo ihuye neza na fotoreiste kuri wafer, ariko hasigaye icyuho cyuzuye azote. Mask ireremba kuri azote, kandi ubunini bwikinyuranyo hagati ya mask na wafer bugenwa nigitutu cya azote.
Kubera ko nta sano ihari iri hagati ya wafer na mask muri lithographie yegeranye, inenge zatangijwe mugihe cya lithographie ziragabanuka, bityo bikagabanya igihombo cya mask no kuzamura umusaruro wafer. Muri lithographie yegeranye, ikinyuranyo hagati ya wafer na mask gishyira wafer mukarere ka Fresnel. Kubaho kwa diffaction bigabanya kurushaho kunoza imikemurire yibikoresho bya lithographie yegeranye, ubwo rero tekinoroji irakwiriye cyane cyane kubyara imashanyarazi ihuriweho hamwe nubunini buri hejuru ya 3μm.
4.2 Intambwe nisubiramo
Intambwe nimwe mubikoresho byingenzi mumateka ya wafer lithographie, yazamuye lithographie ya sub-micron mubikorwa byinshi. Intambwe ikoresha ikibanza gisanzwe cya 22mm × 22mm hamwe na optique ya projection ya optique ifite igabanuka rya 5: 1 cyangwa 4: 1 kugirango yimure igishushanyo kuri mask kuri wafer.
Intambwe-na-gusubiramo imashini ya lithographie muri rusange igizwe na sisitemu yo kwerekana ibintu, icyiciro cyakazi cyicyiciro, icyiciro cya mask icyiciro, icyerekezo / kuringaniza ibice, guhuza ibice, uburyo bukuru bwibanze, uburyo bwo kwimura wafer, sisitemu yo kohereza mask. , sisitemu ya elegitoronike, hamwe na software.
Ibikorwa bisanzwe byo gukora intambwe-no-gusubiramo imashini ya lithographie niyi ikurikira:
Ubwa mbere, wafer yashizwemo na fotoreziste yimurirwa kumeza yakazi ukoresheje sisitemu yo kwimura wafer, hanyuma mask igomba kwerekanwa yimurirwa kumeza ya mask ukoresheje sisitemu yo kohereza mask;
Hanyuma, sisitemu ikoresha kwibanda / kuringaniza sisitemu kugirango ikore uburebure bwingingo zingana kuri wafer kurwego rwakazi kugirango ibone amakuru nkuburebure nuburinganire buringaniye bwubuso bwa wafer kugirango bugaragare, kugirango ahantu hagaragara wafer irashobora guhora igenzurwa mubwimbitse bwibanze bwintego mugihe cyo kwerekana;Ibikurikira, sisitemu ikoresha guhuza ibice kugirango ihuze mask na wafer kuburyo mugihe cyo kwerekana imurikagurisha ryerekana neza ishusho ya mask hamwe na wafer yerekana ihererekanyabubasha buri gihe mubisabwa byuzuye.
Hanyuma, intambwe-na-ibikorwa-bikorwa bya wafer yose yarangiye ukurikije inzira yagenwe kugirango tumenye imikorere yimikorere.
Imashini ikurikiraho hamwe na scaneri ya lithographie imashini ishingiye kubikorwa byibanze byavuzwe haruguru, kunoza intambwe → guhura na scanne → kwerekana, no kwibanda / kuringaniza → guhuza → kwerekana ibyerekezo byombi kugirango bipime (kwibanda / kuringaniza → guhuza) no gusikana Kugaragara.
Ugereranije nintambwe-na-scan ya mashini ya lithographie, imashini yintambwe-isubiramo imashini ya lithographie ntabwo ikenera kugera kumurongo wohanagura wa mask na wafer, kandi ntibisaba kumeza ya mask yo kubisikana hamwe na sisitemu yo kugenzura ibizamini. Kubwibyo, imiterere iroroshye, igiciro ni gito, kandi imikorere ni iyo kwizerwa.
Nyuma ya tekinoroji ya IC yinjiye 0.25 mm, ikoreshwa ryintambwe-nisubiramo-lithographie ryatangiye kugabanuka kubera ibyiza byintambwe-na-scan lithographie mugusikana ingano yumurima hamwe nuburinganire. Kugeza ubu, intambwe yanyuma-isubiramo lithographie yatanzwe na Nikon ifite umwanya uhagaze neza wo kureba nkuw'intambwe-na-scan ya lithographie, kandi irashobora gutunganya wafer zirenga 200 mu isaha, hamwe n’umusaruro mwinshi cyane. Ubu bwoko bwimashini ya lithographie ikoreshwa cyane cyane mugukora ibice bya IC bidakomeye.
4.3 Gusikana Intambwe
Ikoreshwa rya intambwe-na-scan lithographie yatangiye mu myaka ya za 90. Mugushiraho urumuri rutandukanye rutanga urumuri, intambwe-na-tekinoroji irashobora gushyigikira uburyo butandukanye bwikoranabuhanga, kuva 365nm, 248nm, 193nm kwibiza muri EUV lithographie. Bitandukanye nintambwe-na-gusubiramo lithographie, umurima umwe ugaragaza intambwe-na-scan lithographie ifata scanning dinamike, ni ukuvuga, icyapa cya mask cyuzuza icyerekezo cyo gusikana icyarimwe ugereranije na wafer; nyuma yikibanza cyerekanwe kirangiye, wafer itwarwa nicyiciro cyakazi hanyuma ikandagira kumwanya ukurikira wo gusikana ikibanza, kandi gusubiramo bikomeje; subiramo intambwe-na-scan yerekanwe inshuro nyinshi kugeza imirima yose ya wafer yose yerekanwe.
Mugushiraho ubwoko butandukanye bwumucyo (nka i-murongo, KrF, ArF), intambwe-scaneri irashobora gushigikira hafi ya tekinoroji ya tekinoroji ya semiconductor imbere-iherezo. Ubusanzwe uburyo bwa silicon bushingiye kuri CMOS bwakoresheje intambwe-scaneri ku bwinshi kuva kuri 0.18 mm; imashini zikabije za ultraviolet (EUV) zikoreshwa muri lithographie kuri ubu zikoreshwa muri node munsi ya 7nm nazo zikoresha intambwe-scan. Nyuma yo guhindura igice cyo guhuza n'imihindagurikire y'ikirere, intambwe-scaneri irashobora kandi gushyigikira ubushakashatsi niterambere ndetse n’umusaruro wibikorwa byinshi bidashingiye kuri silikoni nka MEMS, ibikoresho byamashanyarazi, nibikoresho bya RF.
Inganda nyamukuru zikora intambwe-na-scan projection ya lithographie harimo ASML (Ubuholandi), Nikon (Ubuyapani), Canon (Ubuyapani) na SMEE (Ubushinwa). ASML yatangije urukurikirane rwa TWINSCAN rwimashini zikoresha intambwe-na-scan ya mashini ya lithographie mu 2001. Ifata ibyiciro bibiri byububiko bwa sisitemu, bishobora kuzamura neza umusaruro w’ibikoresho kandi bikaba byarakoreshejwe cyane imashini yo mu bwoko bwa lithographie ikoreshwa cyane.
4.4 Kwibiza
Birashobora kugaragara uhereye kuri formula ya Rayleigh ko, mugihe uburebure bwumurambararo butagihinduka, inzira nziza yo kurushaho kunoza imiterere yishusho ni ukongera umubare wimibare ya sisitemu yo gufata amashusho. Kumashusho yerekana amashusho ari munsi ya 45nm no hejuru yayo, uburyo bwa ArF bwumutse bwumuti ntibushobora kuba bwujuje ibyangombwa (kuko bushigikira imiterere ntarengwa yo gufata amashusho ya 65nm), birakenewe rero gutangiza uburyo bwo kwibiza. Mu buhanga bwa lithographie gakondo, uburyo buri hagati ya lens na Photoresist ni umwuka, mugihe tekinoroji ya lithographie yo kwibiza isimbuza ikirere hamwe n’amazi (ubusanzwe amazi ya ultrapure hamwe nigipimo cya 1.44).
Mubyukuri, tekinoroji ya lithographie ikoreshwa mu kugabanya uburebure bwumurongo wumucyo nyuma yumucyo unyuze mumashanyarazi kugirango urusheho gukemuka, kandi igipimo cyo kugabanuka nikimenyetso cyo kugabanya ibintu byamazi. Nubwo imashini yimyandikire ya immersion nubwoko bwimashini ya lithographie yintambwe-na-scan, kandi igisubizo cyibikoresho bya sisitemu ntabwo cyahindutse, ni uguhindura no kwagura imashini ya ArF intambwe-na-scan ya lithographie kubera kwinjiza tekinoroji yingenzi ijyanye nayo kwibiza.
Ibyiza bya lithographie yibiza ni uko, kubera ubwiyongere bwumubare wimibare ya sisitemu, ubushobozi bwo gukemura amashusho yimashini yintambwe-scaneri yimashini ya lithographie iratera imbere, ishobora kuzuza ibisabwa kugirango ikemurwe munsi ya 45nm.
Kubera ko imashini ya immersion lithography iracyakoresha isoko ya ArF yumucyo, gukomeza inzira biremewe, bizigama ikiguzi cya R&D yumucyo, ibikoresho nibikorwa. Hashingiwe kuri ibyo, uhujwe nubushushanyo bwinshi hamwe nubuhanga bwo kubara bwa lithographie, imashini yandika ya immersion irashobora gukoreshwa kuri node ya 22nm na munsi. Mbere yuko imashini ya litiro ya EUV ishyirwa mubikorwa rusange, imashini ya lithographie yo kwibiza yari yarakoreshejwe henshi kandi yashoboraga kuzuza ibisabwa muri node ya 7nm. Ariko, kubera kwinjiza amazi yibiza, ingorane zubwubatsi bwibikoresho ubwabyo byiyongereye cyane.
Ikoranabuhanga ryingenzi ryibanze ririmo tekinoroji yo gutanga no kugarura ibintu, tekinoroji yo gufata neza imirima y’amazi, kwanduza lithographie ihumanya hamwe n’ikoranabuhanga rishinzwe kurwanya inenge, guteza imbere no gufata neza lens nini cyane ya aperture immersion projection projection, hamwe n’ikoranabuhanga ryerekana ubuziranenge mu bihe byo kwibiza.
Kugeza ubu, imashini yubucuruzi ya ArFi intambwe-na-scan ya lithographie itangwa ahanini n’ibigo bibiri, aribyo ASML yo mu Buholandi na Nikon yo mu Buyapani. Muri byo, igiciro cya ASML NXT1980 Di imwe ni miliyoni 80 z'amayero.
4.4 Imashini ikabije ya Ultraviolet
Kugirango tunonosore imiterere ya Photolithography, uburebure bwumurambararo buragabanuka nyuma yumucyo utanga urumuri, kandi urumuri rukabije rwa ultraviolet rufite uburebure bwa 10 kugeza 14 nm rwashyizwe ahagaragara nkisoko yumucyo. Uburebure bwumucyo ultraviolet ukabije ni mugufi cyane, kandi sisitemu ya optique yerekana ishobora gukoreshwa mubusanzwe igizwe na firime nyinshi zerekana amashusho nka Mo / Si cyangwa Mo / Be.
Muri byo, theoretique ntarengwa yerekana firime ya Mo / Si igizwe nuburebure bwumurambararo wa 13.0 kugeza 13.5nm ni 70%, naho theoretique ntarengwa ya firime ya Mo / Be igizwe nabantu benshi kuri metero ngufi ya 11.1nm ni 80%. Nubwo ibyerekanwa bya Mo / Be bigaragaza amashusho menshi biri hejuru, Be ni uburozi bukabije, kubwibyo ubushakashatsi bwibikoresho nkibi bwarahebwe mugihe hateguwe tekinoroji ya litiro ya EUV.Ubu buryo bwa tekinoroji ya EUV ikoresha firime ya Mo / Si, kandi uburebure bwayo bwerekanwe na 13.5nm.
Inzira nyamukuru ya ultraviolet yumucyo ikoresha tekinoroji ya plasma yakozwe na laser (LPP), ikoresha lazeri yimbaraga nyinshi kugirango ishimishe plasma ishushe ya Sn plasma kugirango itange urumuri. Kuva kera, imbaraga no kuboneka kwumucyo byabaye inzitizi zibuza imikorere yimashini ya litiro ya EUV. Binyuze muri master oscillator power amplifier, tekinoroji ya plasma (PP) hamwe nubuhanga bwo gukusanya indorerwamo yo gusukura indorerwamo, imbaraga n’umutekano by’umucyo wa EUV byatejwe imbere cyane.
Imashini ya litiro ya EUV igizwe ahanini na sisitemu nkisoko yumucyo, itara, lens lens, icyiciro cyakazi, icyiciro cya mask, guhuza wafer, kwibanda / kuringaniza, gukwirakwiza mask, kwanduza wafer, hamwe na vacuum. Nyuma yo kunyura muri sisitemu yo kumurika igizwe nibyuma byinshi byometseho urumuri, urumuri rukabije rwa ultraviolet rumurikirwa kuri mask yerekana. Umucyo ugaragazwa na mask winjira muri optique yuzuye yerekana amashusho yerekana amashusho agizwe nurukurikirane rwerekana, hanyuma amaherezo ishusho igaragara ya mask iteganijwe hejuru ya wafer mubidukikije.
Umwanya wo kwerekana no kwerekana amashusho yo kureba imashini ya lithographie ya EUV byombi bifite imiterere ya arc, kandi uburyo bwo gusikana intambwe ku yindi ikoreshwa kugirango ugere kuri wafer yuzuye kugirango uzamure igipimo cy’ibisohoka. Imashini ya ASML yateye imbere cyane ya NXE EUV ikoresha imashini ikoresha lithographie ikoresha urumuri rwerekana urumuri rufite uburebure bwa 13.5nm, mask yerekana (6 ° oblique incidence), sisitemu ya 4x yo kugabanya ibintu byerekana ibintu bifite indorerwamo 6 (NA = 0.33), a gusikana umurima wo kureba 26mm × 33mm, hamwe nibidukikije.
Ugereranije n’imashini ya lithographie yibiza, igisubizo kimwe cyerekana imashini ya litiro ya EUV ikoresheje amasoko y’umucyo ukabije ultraviolet yatejwe imbere cyane, ishobora kwirinda neza inzira igoye isabwa kugirango fotolitografiya ikore ibishushanyo mbonera. Kugeza ubu, imiterere imwe yerekana imashini ya litiro ya NXE 3400B ifite numero ya 0.33 igera kuri 13nm, naho igipimo gisohoka kigera ku bice 125 / h.
Mu rwego rwo guhaza ibikenewe byo kurushaho kwagura Amategeko ya Moore, mu gihe kiri imbere, imashini zikoresha lithographie ya EUV zifite umubare wa 0.5 zifatika zizashyiraho uburyo bwo kwerekana ibintu hamwe no kuzimya urumuri rwagati, hakoreshejwe ubunini bwa asimmetrike inshuro 0.25 / 0.125, hamwe na gusikana ibyerekanwe bizagabanuka kuva kuri 26m × 33mm kugeza kuri 26mm × 16.5mm, kandi imiterere imwe yerekana irashobora kugera munsi ya 8nm.
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