2 ″ Gallium Oxide Substrates

Ibisobanuro bigufi:

2 ″ Gallium Oxide Substrates- Hindura ibikoresho bya semiconductor hamwe na Semicera yo mu rwego rwo hejuru 2 ″ Gallium Oxide Substrates, ikozwe neza kugirango ikore neza muri electronics power na UV zikoreshwa.


Ibicuruzwa birambuye

Ibicuruzwa

Semicerayishimiye gutanga2 "Substrates ya Gallium Oxide, ibikoresho bigezweho bigamije kuzamura imikorere yibikoresho bigezweho. Izi substrate, zakozwe muri Oxide ya Gallium (Ga2O3), biranga ultra-rugari ya bande, bigatuma bahitamo neza kubububasha bukomeye, inshuro nyinshi, na UV optoelectronic progaramu.

 

Ibintu by'ingenzi:

• Ultra-Wide Bandgap:.2 "Substrates ya Gallium Oxidetanga umurongo udasanzwe wa hafi 4.8 eV, utanga imbaraga za voltage nubushyuhe bwo hejuru, birenze kure ubushobozi bwibikoresho bya semiconductor gakondo nka silicon.

Umuvuduko udasanzwe wo kumeneka: Izi substrate zifasha ibikoresho gukora voltage iri hejuru cyane, bigatuma ikora neza kuri electronics power, cyane cyane mumashanyarazi menshi.

Imyitwarire myiza yubushyuhe.

Ibikoresho byo mu rwego rwo hejuru:.2 "Substrates ya Gallium Oxidetanga ubucucike buke nubuziranenge bwa kristaline, byemeza imikorere yizewe kandi ikora neza yibikoresho bya semiconductor.

Porogaramu zitandukanye.

 

Fungura ubushobozi bwuzuye bwibikoresho bya semiconductor hamwe na Semicera2 "Substrates ya Gallium Oxide. Substrates zacu zashizweho kugirango zihuze ibyifuzo bikenewe byiterambere rya none, byemeza imikorere myiza, kwiringirwa, no gukora neza. Hitamo Semicera kubikoresho bigezweho bya semiconductor itwara udushya.

Ibintu

Umusaruro

Ubushakashatsi

Dummy

Ibipimo bya Crystal

Polytype

4H

Ikosa ryerekana icyerekezo

<11-20> 4 ± 0.15 °

Ibipimo by'amashanyarazi

Dopant

Ubwoko bwa Azote

Kurwanya

0.015-0.025ohm · cm

Ibipimo bya mashini

Diameter

150.0 ± 0.2mm

Umubyimba

350 ± 25 mm

Icyerekezo cyibanze

[1-100] ± 5 °

Uburebure bwibanze

47.5 ± 1.5mm

Igice cya kabiri

Nta na kimwe

TTV

≤5 mm

≤10 mm

≤15 mm

LTV

≤3 μm (5mm * 5mm)

≤5 μm (5mm * 5mm)

≤10 μ m (5mm * 5mm)

Umuheto

-15 mm ~ 15 mm

-35μm ~ 35μm

-45μm ~ 45μm

Intambara

≤35 mm

≤45 mm

≤55 mm

Imbere (Si-face) ubukana (AFM)

Ra≤0.2nm (5μm * 5μm)

Imiterere

Ubucucike bwa Micropipe

<1 ea / cm2

<10 ea / cm2

<15 ea / cm2

Umwanda

≤5E10atoms / cm2

NA

BPD

≤1500 ea / cm2

0003000 ea / cm2

NA

TSD

≤500 ea / cm2

0001000 ea / cm2

NA

Ubwiza bw'imbere

Imbere

Si

Kurangiza

Si-face CMP

Ibice

≤60ea / wafer (ubunini≥0.3μm)

NA

Igishushanyo

≤5ea / mm. Uburebure bwuzuye ≤Ibipimo

Uburebure bwuzuye≤2 * Diameter

NA

Igishishwa cya orange / ibyobo / ikizinga / imirongo / ibice / kwanduza

Nta na kimwe

NA

Imipira yimpande / ibyerekana / kuvunika / isahani

Nta na kimwe

Agace ka polytype

Nta na kimwe

Agace kegeranye ≤20%

Agace kegeranye ≤30%

Ikimenyetso cya laser imbere

Nta na kimwe

Inyuma Yinyuma

Kurangiza

C-isura CMP

Igishushanyo

≤5ea / mm, Uburebure bwa Cumulative≤2 * Diameter

NA

Inenge zinyuma (chips / indents)

Nta na kimwe

Inyuma yinyuma

Ra≤0.2nm (5μm * 5μm)

Ikimenyetso cya laser inyuma

Mm 1 (uhereye hejuru)

Impande

Impande

Chamfer

Gupakira

Gupakira

Epi-yiteguye hamwe no gupakira vacuum

Gupakira cassette nyinshi

* Inyandiko : "NA" bivuze ko nta cyifuzo Ibintu bitavuzwe bishobora kwerekeza kuri SEMI-STD.

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SiC wafers

  • Mbere:
  • Ibikurikira: